Plasma enhanced CVD of SiOxCyHz thin film on different textile fabrics: Influence of exposure time on the abrasion resistance and mechanical properties

In order to improve textile fabric abrasion resistance, in this work a SiO_xC_yH_z thin film was realized by low pressure plasma chemical vapour deposition (PCVD) at room temperature, using hexamethyldisiloxane (HMDSO) as precursor compound. To test changes in the performance properties of the surface finished samples as a function of the type of the substrate, the deposition was carried out on different textile fabrics. The polymerization processes were followed by weight measurements of textile fabrics. It was found that, after PCVD, a significantly lower fabric weight loss was observed on treated samples after rubbing than on the untreated samples. The morphology, elemental composition and type of chemical bonding present in the film applied on textile fabrics were also investigated using electron scanning microscopy (SEM), energy dispersive X-ray (EDX) and infrared spectroscopy techniques (FT-IR (ATR)). The results showed a substantial enhancement of wear resistance for the surfaces modified with the presented process, while tensile and tearing strength were adversely affected.