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Threading dislocation density comparison between GaN grown on the patterned and conventional sapphire substrate by high resolution X-ray diffraction
Authors:ZHANG YuChao  XING ZhiGang  MA ZiGuang  CHEN Yao  DING GuoJian  XU PeiQiang  DONG ChenMing  CHEN Hong & LE XiaoYun School of Physics    Nuclear Energy Engineering  Beihang University  Beijing   China   Renewable Energy Laboratory
Affiliation:ZHANG YuChao1,XING ZhiGang2,MA ZiGuang2,CHEN Yao2,DING GuoJian2,XU PeiQiang2,DONG ChenMing3,CHEN Hong2 & LE XiaoYun1 1 School of Physics , Nuclear Energy Engineering,Beihang University,Beijing 100190,China,2 Renewable Energy Laboratory,Institute of Physics,Chinese Academy of Sciences,3 School of Information , Communication,Tianjin Polytechnic University,Tianjin 300160
Abstract:
Keywords:GaN  patterned sapphire substrate  threading dislocation  XRD  
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