Diblock copolymer micellar lithography: 1. Intermicellar interactions and pathways for control of monomicellar film structure |
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| Authors: | V V Terekhin O V Dement’eva A V Zaitseva V M Rudoy |
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| Institution: | (1) Shandong Provincial Key Laboratory of Fluorine Chemistry and Chemical Materials, School of Chemistry and Chemical Engineering, University of Jinan, 106 Jiwei Road, Jinan, 250022, People’s Republic of China;(2) College of Physics and Electronics, Shandong Normal University, 88 Wenhuadong Road, Jinan, 250014, People’s Republic of China; |
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| Abstract: | The formation of reverse micelles of amphiphilic diblock copolymers of styrene and 2-vinylpyridine in selective (for one of
the blocks) solvent (toluene) is studied by dynamic light scattering and atomic force and transmission electron microscopies,
as well as by absorption spectroscopy and X-ray photoelectron spectroscopy techniques. It is revealed that the behavior of
micelles of block copolymers with different ratios of block lengths and absolute molecular masses in solution is fundamentally
different depending on the amount of added metal salt. The possibility of controlled variations in the characteristic sizes
of two-dimensional ordered ensembles of micelles on the surface of silicon wafers is demonstrated. It is shown that, in some
cases, the distance between the centers of micelles in ensemble depends on the concentration of copolymer solution and the
amount of metal salt preliminarily added to the solution. |
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