WO3 oxide film formation on tungsten in O2/H2 discharges

The features of tungsten oxidation in a flowing O₂ or O₂/H₂ mixture glow discharge with a hollow cathode are investigated in the cathode, plasma, and afterglow regions at T = 300–350 K. The structure and composition of the samples are analyzed via reflection high-energy electron diffraction, reflection X-ray diffraction, electron probe microanalysis, and X-ray photoelectron spectroscopy. The results of analysis show that the metal surface is covered by a thin film (5–10 nm thick) of amorphous porous hydrated tungsten oxide (WO₃) after its exposure to the discharge and storage in air. The study of the film composition using a time-of-flight mass spectrometer indicates that the WO₃ film contains (WO₃) _n (n = 1–6) clusters and water molecules adsorbed in the pores. After exposure of the polycrystals to the O₂/H₂ discharge, the selective intense oxidation of individual grains is detected in the cathode region; the surrounding areas are subjected to weaker oxidation. The thicknesses of the WO₃ films on neighbouring grains differ by more than tenfold. Such grains can be the source of tungsten dust in plasma installations.