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Photocatalytic behavior of heavy La-doped TiO2 films deposited by pulsed laser deposition using non-sintered target
Authors:T. Ando  K. Masuda  K. Suzuki  S. Masutani  H. Uchida  A. Kamimoto
Affiliation:a Department of Electrical Engineering, College of Science and Technology, Nihon University, 1-8-14 Surugadai, Kanda, Chiyoda-ku, Tokyo, Japan
b School of Dentistry, Nihon University, 1-8-14 Surugadai, Kanda, Chiyoda-ku, Tokyo, Japan
Abstract:We have investigated the control of photocatalytic behavior under deposited conditions of non-sintered target of different molar ratios with TiO2 and La2O3 from 1:0 to 1:2 for heavily La doping, and post-annealing temperature from 600 °C to 1000 °C for crystallizing by pulsed laser deposition. We have successfully crystallized heavily La-doped TiO2 films with post-annealing temperature over 800 °C and with molar ratio of TiO2:La2O3 over 1:1 on a quartz substrate. Heavily La-doped TiO2 films are observed the decomposition of methylene blue and a water-splitting reaction in photocatalytic behavior under Xe light irradiation. When stoichiometric La-doped TiO2 (TiO2:La2O3 = 1: 1) is synthesized with heat-treatment at 900 °C, the best results are obtained under photocatalytic behavior and pure La2Ti2O7 crystalline were obtained.
Keywords:La-doped TiO2 films   La2Ti2O7   Photocatalytic behavior   Water-splitting reaction
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