Modification of the surface properties of polyimide films using polyhedral oligomeric silsesquioxane deposition and oxygen plasma exposure |
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Authors: | Christopher J. Wohl Marcus A. Belcher John W. Connell |
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Affiliation: | a NASA Postdoctoral Fellow at NASA Langley Research Center, Hampton, VA 23681-2199, United States b National Institute of Aerospace, Hampton, VA 23666-6147, United States c NASA Langley Research Center, Hampton, VA 23681-2199, United States |
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Abstract: | Topographically rich surfaces were generated by spray-coating organic solutions of a polyhedral oligomeric silsesquioxane, octakis(dimethylsilyloxy)silsesquioxane (POSS), on Kapton® HN films and exposing them to radio frequency generated oxygen plasma. Changes in both surface chemistry and topography were observed. High-resolution scanning electron microscopy indicated substantial modification of the POSS-coated polyimide surface topographies as a result of oxygen plasma exposure. Water contact angles varied from 104° for unexposed POSS-coated surfaces to ∼5° for samples exposed for 5 h. Modulation of the dispersive and polar contributions to the surface energy was determined using van Oss Good Chaudhury theory. Changes in surface energy are related to potential adhesive interactions with lunar dust simulant particles. |
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Keywords: | Polyimide Polyhedral oligomeric silsesquioxane Oxygen plasma Lunar dust |
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