Photochemical welding of silica microspheres to silicone rubber by ArF excimer laser |
| |
| Authors: | Masayuki Okoshi Minako Iyono Tsugito Yamashita |
| |
| Institution: | a Department of Electrical and Electronic Engineering, National Defense Academy, 1-10-20 Hashirimizu, Yokosuka 239-8686, Japan
b Department of Applied Material and Life Science, Kanto Gakuin University, 1-50-1 Mutsuura-Higashi, Kanazawa-Ku, Yokohama 236-8501, Japan |
| |
| Abstract: | Transparent fused silica (SiO2) microspheres 2.5 μm in diameter were photochemically welded to transparent, flexible silicone rubber (SiO(CH3)2]n) substrate by 193 nm ArF excimer laser induced photochemical modification of silicone into silicon oxide. Single layer of silica microspheres was easily formed on an adhesive silicone rubber before laser irradiation after dropping of silica microspheres dispersed in ethanol and subsequent tape peeling. The welding rate, the percentage of welded microspheres tested by ultrasonic cleaning with ethanol, was examined by varying the single pulse fluence and irradiation time of ArF excimer laser. The welding layer underneath microsphere, silicon oxide, was also found to emit white light of strong intensity under UV light illumination. |
| |
| Keywords: | 81 20 Vj 82 50 Hp |
| 本文献已被 ScienceDirect 等数据库收录！ |
|
