Replication of mold for UV-nanoimprint lithography using AAO membrane |
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| Authors: | Weimin Zhou Jing Zhang Yanbo Liu Guoquan Min Jianping Zhang |
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| Institution: | a Laboratory of Nanotechnology, Shanghai Nanotechnology Promotion Center (SNPC), Shanghai 200237, China
b State Key Laboratory of Functional Materials for Informatics, Laboratory of Nanotechnology, Shanghai Institute of Microsystem and Information Technology, Chinese Academy of Sciences, Shanghai 200050, China |
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| Abstract: | A simple and highly effective method to the replication of soft mold based on the anodic aluminum oxide (AAO) membrane was developed. The soft mold with nanopillar arrays was composed of the toluene diluted PDMS layer supported by the soft PDMS. A water contact angle as high as 114° was achieved. The hexagonally well-order arrays of holes of nanometer dimensions, ∼100 nm pore diameter and 125 nm center-to-center pore, could be gained over large areas by UV-nanoimprint lithography (UV-NIL) with the replicated soft PDMS mold. It is expected that the developed soft mold would find applications in light emitting diodes devices. |
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| Keywords: | 81 16 Rf 81 65 Mq 81 16 Dn 85 40 Hp |
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