Chromium carbide thin films deposited by ultra-short pulse laser deposition |
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Authors: | R. Teghil A. Santagata A. Galasso |
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Affiliation: | a Dipartimento di Chimica, Università della Basilicata, Via N. Sauro 85, 85100 Potenza, Italy b CNR-IMIP, Unità di Potenza, Via S. Loja, Zona Ind., 85050 Tito Scalo (PZ), Italy |
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Abstract: | Pulsed laser deposition performed by a laser with a pulse duration of 250 fs has been used to deposit films from a Cr3C2 target. Due to the different processes involved in the laser ablation when it is performed by an ultra-short pulse source instead of a conventional short pulse one, it has been possible to obtain in vacuum films containing only one type of carbide, Cr3C2, as shown by X-ray photoelectron spectroscopy. On the other hand, Cr3C2 is not the only component of the films, since a large amount of amorphous carbon is also present. The films, deposited at room temperature, are amorphous and seem to be formed by the coalescence of a large number of particles with nanometric size. The film composition can be explained in terms of thermal evaporation from particles ejected from the target. |
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Keywords: | 52.25.Tx 52.38.Mf 81.15.Fg |
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