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Study of the structural and magnetic characteristics of epitaxial Fe3Si/Si(111) films |
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| Authors: | I A Yakovlev S N Varnakov B A Belyaev S M Zharkov M S Molokeev I A Tarasov S G Ovchinnikov |
| Institution: | 1. Kirensky Institute of Physics, Siberian Branch, Russian Academy of Sciences, Krasnoyarsk, 660036, Russia 2. Reshetnev Siberian State Aerospace University, Krasnoyarsk, 660014, Russia 3. Siberian Federal University, Krasnoyarsk, 660041, Russia |
| Abstract: | The results of the structural and magnetic studies of the epitaxial structure prepared during the simultaneous evaporation from two iron and silicon sources on an atomically pure Si(111)7 × 7 surface at a substrate temperature of 150°C have been presented. The epitaxial structure has been identified as a single-crystal Fe3Si silicide film with the orientation Si111]‖Fe3Si111] using methods of the X-ray structural analysis, transmission electron microscopy, and reflection high-energy electron diffraction. It has been established that the epitaxial Fe3Si film at room temperature has magnetic uniaxial anisotropy (H a = 26 Oe) and a relatively narrow uniform ferromagnetic resonance line (ΔH = 11.57 Oe) measured at a pump frequency of 2.274 GHz. |
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