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New bonding modes of gas-phase deposited gamma-aminopropyltriethoxysilane on silica studied by 29Si CP/MAS NMR
Authors:Ek Satu  Iiskola Eero I  Niinistö Lauri  Pakkanen Tuula T  Root Andrew
Affiliation:Laboratory of Inorganic and Analytical Chemistry, Helsinki University of Technology, P.O. Box 6100, FIN-02015 Espoo, Finland.
Abstract:Besides the well-known reaction between the ethoxy groups of the silane end of the gamma-aminopropyltriethoxysilane (APTS) molecule and the silanols of silica, the amino ends of APTS molecules were observed to react in the gas phase with ethoxy groups of other APTS molecules and silanols of silica at elevated temperatures on the silica surface, dehydroxylated at 600 degrees C, forming Si-N linkages, as established by 29Si CP/MAS NMR.
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