Light scattering topography and photoluminescence topography

Two attractive methods for materials characterization are applied and discussed: (a) light scattering topography for fast and nondestructive testing of structural perfection, and (b) photoluminescence topography for evaluating the light emission characteristics of photoluminescent materials. Among the examples presented are semiconductor substrates and films of silicon, silicon-on-insulators of different kind, and III–V materials.