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Buried Ni/Cu(001) interface at the atomic scale
Authors:Meyerheim H L  Sander D  Negulyaev N N  Stepanyuk V S  Popescu R  Popa I  Kirschner J
Institution:Max-Planck-Institut für Mikrostrukturphysik, Weinberg 2, D-06120 Halle, Germany. hmeyerhm@mpi-halle.mpg.de
Abstract:We present a quantitative surface x-ray analysis of the buried Ni/Cu(001) interface structure after deposition of 3 and 5 monolayers of Ni at room temperature. Interface mixing is found where 27+/-10% of top layer Cu atoms are exchanged by Ni. Atomic scale simulations reveal a kinetic pathway for the Ni/Cu-exchange process and explain the observed limited degree of intermixing. A disperse distribution of Ni within the Cu surface with a preferential Ni-Ni separation of 3-4 nearest neighbor distances is determined.
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