首页 | 本学科首页   官方微博 | 高级检索  
     

水溶性聚合物和两亲聚合物:9.新型丙烯酰胺基两亲单体及其两亲聚合物的单层膜研究
引用本文:方天如,朱小兵,吕安德,庞小敏. 水溶性聚合物和两亲聚合物:9.新型丙烯酰胺基两亲单体及其两亲聚合物的单层膜研究[J]. 功能高分子学报, 1991, 0(3)
作者姓名:方天如  朱小兵  吕安德  庞小敏
作者单位:中国科学院长春应化所(方天如,朱小兵),中国科学院长春物理所(吕安德),中国科学院长春物理所(庞小敏)
摘    要:本文对新型两亲单体,2-丙烯酰胺基十六烷磺酸(AMC_(16)S),及其两亲聚合物PAMC_(16)S在空气-水界面上形成单层膜的特点进行了研究。AMC_(16)S可通过在亚相中添加Ca~(2+)或Cd~(2+)等多价阳离子在界面上原位生成不溶性磺酸盐的方法获得满意的成膜行为。PAMC_(16)S不溶于水,可直接成膜。发现,PAMC_(16)S的成膜行为与亚相的性质明显相关。纯水亚相下PAMC_(16)S的极限单体链节面积较大,如亚相含有Ca~(2+)或Cd~(2+),极限面积明显缩小,说明烷基碳氢链的排列趋向紧密。

关 键 词:两亲单体  两亲聚合物  2-丙烯酰胺基十六烷磺酸  聚(2-丙烯酰胺基十六烷磺酸)  单层膜

Water Soluble and Amphiphilic Polymers: 9. Studies on monolayer formation of a novel acrylamido-amphilic monomer and its amphiphilic polymer
Tianru Hang Xiaobing Zhu. Water Soluble and Amphiphilic Polymers: 9. Studies on monolayer formation of a novel acrylamido-amphilic monomer and its amphiphilic polymer[J]. Journal of Functional Polymers, 1991, 0(3)
Authors:Tianru Hang Xiaobing Zhu
Affiliation:Tianru Hang Xiaobing Zhu (Changchun Inst. of Appl. Chem.) Ande Lu Xiaomin Pang (Changxhum Inst. of Phys.)
Abstract:The monolayer formation on the air-water interface of a new amphiphilic monmer, 2-acrylamidohexadecylsulfonic acid (AMC16S), and the amphiphilic polymer PAMC_(16)S has been investigated. The spreading of the watersoluble amphiphilic monomer can be achieved by adding Ca~(2+)or Cd~(2+)multivalent cations into the subphase and forming the insoluble sulfonate in situs. As PAMC_(16)S is insoluble in water. It can, therefore, be directly used for monolayer formation. It has been found that the properties of the subphaes has a profound influence on the film-forming behaviour of PAMC_(16)S. Pure water results in a lager limiting area/monomer unit. When the subphase contains Ca~(2+)or Cd~(2+), the limiting area decreases markedly, indicating closer packing of the aliphatic hydrocarbon chains.
Keywords:ampiphilic monomer   amphphilic polymer   2-Acrylamideo-hexadecy lsulfonic acid   poly(2-acrylamidohexadecylsulfonic acid)   monolayer
本文献已被 CNKI 等数据库收录!
设为首页 | 免责声明 | 关于勤云 | 加入收藏

Copyright©北京勤云科技发展有限公司  京ICP备09084417号