The application of cathodic sputtering to the production of atomic vapours in atomic fluorescence spectroscopy

Cathodic sputtering is used as a source of atomic vapour for the chemical analysis of metals and alloys by atomic fluorescence spectroscopy. The sputtered vapour is produced in a Pyrex glow-discharge chamber which is suitable for the rapid interchange of flat, metallic samples. The discharge operates with a water-cooled cathode specimen and a flow-through gas control system. Linear calibration curves are obtained for the determination of nickel, chromium, copper, manganese and silicon in some iron-base alloy standards. For nickel, chromium and copper, detection limits are of the order of 20 ppm in the iron, and for manganese and silicon about 70 and 400 ppm respectively. The reproducibility of the fluorescence measurements is about ±1%. The system can be readily adapted to provide simultaneous multi-element analysis.