等离子体增强脉冲激光沉积o-BN薄膜

利用等离子体增强脉冲激光沉积系统在Si（100）基底上沉积出了高质量的o-BN薄膜，利用红外光谱（FTIR）、X射线衍射谱（XRD）和原子力显微镜照片对o-BN薄膜进行了表征.通过红外光谱（FTIR）得到o-BN薄膜的红外峰特征峰值为1189cm^-1，1585cm^-1和1450cm^-1；由XRD谱得到o-BN薄膜的（111），（020），（021），（310）和（243）各晶面的衍射峰, 特别是（310）和（243）晶面的衍射峰非常强；通过原子力显微镜照片清楚看到BN薄膜具有尖状突起的表面形貌.关键词：等离子体增强脉冲激光沉积氮化硼薄膜X射线衍射谱

Deposition of orthorhombic boron nitride films by plasma-enhanced pulsed laser deposition

In this paper, high quality orthorhombic boron nitride （o-BN） films were prepared on Si（100） substrate by plasma-enhanced pulsed laser deposition （PE-PLD） for the first time. The films were characterized by Fourier transform infrared （FTIR） spectroscopy，glancing-angle X-ray diffraction （XRD） and atomic force microscopic （AFM）. In the FTIR spectrum of the film, we can see three characteristic peaks around 1189cm^-1, 1585cm^-1 and 1450cm^-1 of o-BN. The diffraction peaks ［111］, ［020］, ［021］, ［310］ and ［243］ all appeared in XRD, especially ［243］ and ［310］ crystal plane diffraction were very strong. The surface morphology was closely observed by AFM photograph.