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Depth resolved structural study of heavy ion induced phase formation in Si/Fe/Si trilayer |
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| Authors: | Parasmani Rajput Ajay Gupta Carlo Meneghini D K Avasthi Nora Darowski I Zizak A Erko |
| Institution: | 1. UGC-DAE Consortium for Scientific Research, University Campus, Khandwa road, Indore, 452017, India 2. Departmenotdi Fisica, Universitá di ‘Roma Tre’, Via della Vasca Navale 84, 00146, Roma, Italy 3. Inter University Accelerator Centre, Aruna Asaf Ali Marg, New Delhi, 110067, India 4. SF2 Magnetism, Hahn-Meitner-Institute, Glienicker str. 100, 14109, Berlin, Germany 5. BESSY, A-Einstein-Strasse 15, 12489, Berlin, Germany |
| Abstract: | Intermixing in Si/Fe/Si trilayer induced by 120 MeV Au ions has been studied. X-ray fluorescence provides information about the depth distribution of Fe atoms, while Mössbauer spectroscopy and XAFS provide information about the changes in the local structure. In the as-deposited film Fe layer is amorphous in nature with a significant Si content in it. Irradiation to a fluence of 1 ×1013 ions/cm2 results in formation of non-magnetic intermixed layer with its hyperfine parameter close to those of Fe0.5Si with CsCl structure. XAFS measurements under X-ray standing wave condition provide depth resolved structural information. |
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