Full-field refractive index measurement with simultaneous phase-shift interferometry |
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| Authors: | Yen-Chang Chu Wei-Yao Chang Kun-Huang Chen Jing-Heng Chen Bo-Chung Tsai Ken Y. Hsu |
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| Affiliation: | 1. Ph.D. program of Electrical and Communications Engineering, Feng Chia University, No.100, Wen Hwa Rd., Taichung 40724, Taiwan, ROC;2. Department of Photonics and Institute of Electro-Optical Engineering, National Chiao Tung University, 1001 Ta-Hsueh Road, Hsinchu 30050, Taiwan, ROC;3. Department of Electrical Engineering, Feng Chia University, No.100, Wen Hwa Rd., Taichung 40724, Taiwan, ROC;4. Department of Photonics, Feng Chia University, No.100, Wen Hwa Rd., Taichung 40724, Taiwan, ROC |
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| Abstract: | Using the phenomenon of total internal reflection and a beam splitting device, a technique of simultaneous phase-shift interferometry is proposed for measuring the full-field refractive index. Because this method applies a beam splitting device that mimics the characteristics of beam splitting and phase modulation, four interferemetric images of various phase distributions can be simultaneously captured. Therefore, this setup can avoid errors caused by non-simultaneous capturing of images and offers the benefits of high stability, ease of operation, and real-time measurement. Furthermore, using the phenomenon of total internal reflection, the phase difference between p- and s-polarized light varies considerably with the refractive index of a tested specimen. This can substantially increase the measurement resolution. The feasibility of this method is verified using an experiment, and the measurement resolution can be higher than 3.65 × 10−4 RIU. |
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| Keywords: | Full-field refractive index Simultaneous phase-shift interferometry Total internal reflection |
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