Plasmonic nanolithography based on cavity resonance through thick metal mask |
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| Authors: | Chaoping Yao Wei Xia Shouqiang Zhang Jia Liu Xiaowei Guo Zhiyou Zhang |
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| Affiliation: | 1. School of Optoelectronic Information, University of Electronic Science and Technology, Chengdu 610054, China;2. Physics Department, Sichuan University, Chengdu 610064, China |
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| Abstract: | Plasmonic lithography is a very promising fabrication technology to obtain nanoscale structures beyond the diffraction limit. In this paper, a new plasmonic lithography is proposed to realize high efficiency fabrication of arbitrary patterns, which is based on cavity resonance through a thick metal mask. The mechanism of the cavity resonance transmission is explored. The one dimension (1D) and two dimension (2D) printings are simulated and discussed. The simulated results show the method that provides potential to pattern feature size with at least 40 nm, about λ/11. |
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| Keywords: | Plasmonic lithography Diffraction limit Cavity resonance Thick metal mask |
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