| 基于反射光谱的单层抗反射膜的非在位膜厚精确控制 |
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| 引用本文： | 徐建明. 基于反射光谱的单层抗反射膜的非在位膜厚精确控制[J]. 光电子．激光, 2010, 0(10): 1507-1510 |
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| 作者姓名： | 徐建明 |
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| 作者单位： | 清华大学电子工程系清华信息科学与技术国家实验室(筹)集成光电子学国家重点实验室; |
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| 基金项目： | 国家自然科学基金资助项目(60536020,60723002,50706022,60977022); 国家“973”重大基础研究计划资助项目(2006CB302800,2006CB921106) |
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| 摘 要： | 提出一种基于反射光谱分析的非在位膜厚控制技术,首先利用椭圆偏振光谱仪确定波长300～1 700 nm范围内的薄膜折射率,由此确定对应于特定波长(如1 550 nm)的最佳抗反射(AR)镀膜沉积条件。然后计算最佳AR镀膜厚度所对应的反射谱,得到相应的CIE标准色谱坐标。通过对比实测镀膜颜色和计算得到的最佳颜色,可以实现小尺寸器件端面上AR镀膜厚度的优化控制。利用这一方法,由等离子体增强化学气相沉积(PECVD)制备的SiNx单层AR镀膜,获得了4.4×10-4的反射率。
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| 关 键 词： | 膜厚控制 抗反射(AR)镀膜 反射光谱 等离子体增强化学气相淀积(PECVD) |
A novel non-situ thickness control method for a single anti-reflection coating thin film based on reflection spectrum analysis |
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| XU Jian-ming. A novel non-situ thickness control method for a single anti-reflection coating thin film based on reflection spectrum analysis[J]. Journal of Optoelectronics·laser, 2010, 0(10): 1507-1510 |
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| Authors: | XU Jian-ming |
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| Affiliation: | XU Jian-ming,XIONG Bing,YUAN He,SUN Chang-zheng,LUO Yi (Tsinghua National Laboratory for Information Science , Technology,State Key Laboratory on Integrated Optoelectronics,Department of Electronic Engineering,Tsinghua University,Beijing 100084,China) |
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| Abstract: | A novel non-situ film thickness control method based on reflection spectrum analysis is proposed for anti-reflection(AR) coating,which is especially suitable for optoelectronic devices with small facet area.The refractive index of the coating film in 300-1 700 nm wavelength range is evaluated by spectroscopic ellipsometery,and the optimum deposition conditions for AR coating film are determined at a specified wavelength(e.g.1 550 nm).The reflection spectrum of AR coating with optimum film thickness and its ... |
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| Keywords: | film thickness control anti-reflection(AR) coating reflection spectrum plasma enhanced chemical vapor deposition(PECVD) |
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