Adsorption of titanium,chromium, and copper atoms on thin aluminum and magnesium oxide film surfaces |
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| Authors: | I V Tvauri A M Turiev N I Tsidaeva M E Gazzaeva G G Vladimirov T T Magkoev |
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| Institution: | 1.K. L. Khetagurov North-Ossetia State University,Vladikavkaz,Russia;2.Saint Petersburg State University,Saint Petersburg,Russia |
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| Abstract: | Methods of Auger electron spectroscopy (AES), spectroscopy of characteristic electron energy losses (SCEEL), slow electron
diffraction (SED), and contact potential difference (CPD) in ultrahigh vacuum are used to investigate the adsorption-emission
properties and stability of two-component film systems formed by putting of Ti, Cr, and Cu atoms on MgO–Mo(011) and Al2O3–Mo(011) surfaces. All atoms have the properties of electronegative adsorbates. Continuous adatom monolayers are formed on
the Al2O3–Mo(011) system surface, and three-dimensional islands are formed on the MgO–Mo(011) surface. The properties of monoatomic
films on the oxide layer surface are close to those observed for bulk materials. No radical changes of the system properties
are detected with increasing dielectric layer thickness. The thermal stability of the newly formed structures decreases in
the order Ti, Cr, Cu, Al2O3(MgO), and Mo(011). |
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