Tailoring exchange bias by oxidizing Co film across a Cu wedge in Cu(wedge)/CoO/Co/Cu(0 0 1) |
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| Authors: | J Wu W Kim ZQ Qiu |
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| Institution: | a Department of Physics, University of California at Berkeley, Berkeley, CA 94720, USA
b Division of Advanced Technology, Korea Research Institute of Standards and Science, 209 Gajeong-Ro, Yuseong-Gu, Daejeon 305-340, Republic of Korea |
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| Abstract: | A new method was developed to control Co film oxidation in an epitaxially grown Cu(wedge)/Co/Cu(0 0 1) film. By annealing the film at 200 °C within 10−6 Torr oxygen environment, we find that the top Cu wedge controls the Co underlayer oxidation continuously as a function of the Cu film thickness. Magneto-Optic Kerr Effect measurement shows that the exchange bias of the resulting CoO/Co film exhibits a systematic variation with the Cu thickness, thus offering a new method of tailoring the exchange bias of CoO/Co films. |
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| Keywords: | Exchange bias Epitaxial growth Magnetic thin films |
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