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Nanostructure and excellent magnetic properties of Co19.35Fe53.28Hf7.92O19.35 films |
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| Authors: | Nguyen Duy Ha Chong Oh Kim |
| Institution: | a The Kamerlingh Onnes Laboratory, Leiden University, P.O. Box 9504, 2300 RA Leiden, The Netherlands b Research Center for Advanced Magnetic Materials, Chungnam National University, Daejeon 305-764, South Korea c Department of Aerospace Engineering, University of Bristol, Queen’s Building, Bristol BS8 1TR, England, United Kingdom |
| Abstract: | This letter reports the novel nanostructure and excellent magnetic properties of Co19.35Fe53.28Hf7.92O19.35 films with varying thicknesses. Among the samples investigated, the film with a thickness of 432 nm exhibits the most excellent magnetic properties: high saturation magnetization,  , low coercivity,  , and high hard-axis anisotropy field of  . The magnetic permeability remains almost stable up to 3 GHz and reaches a maximum at the ferromagnetic resonant frequency of 4.024 GHz. The excellent magnetic characteristics of this film in addition to a very high electrical resistivity of 3569 μΩ cm make it ideal for uses in high-frequency applications of micromagnetic devices. It reveals that these superior properties are ascribed to the formed peculiar nanostructure. A magnetic phase separation appears to occur strongly as the film thickness increases over 437 nm, which, in turn, modifies the high-frequency behavior. |
| Keywords: | 75 70 Ak 85 70 Kh |
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