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The reaction of oxygen and water with iron films studied by X-Ray photoelectron spectroscopy
Authors:J.K. Gimzewski  B.D. Padalia  S. Affrossman  L.M. Watson  D.J. Fabian
Affiliation:Department of Pure and Applied Chemistry, University of Strathclyde, Glasgow, G1 1XL, UK;Department of Metallurgy, University of Strathclyde, Glasgow, G1 1XN, UK
Abstract:Adsorption of oxygen on iron at ambient temperature and low pressure is shown by XPS to give a chemisorbed species and the oxide, Fe2O3. At low temperatures a further adsorbed species is detected, similar to the nickel-oxygen system. Correction of the intensity of the oxygen signal for depth results in an oxidation curve in agreement with reported work using other techniques, i.e. oxidation is fast until about four layers of oxide are formed, at an exposure of ca. 102 L, and then proceeds slowly to about ten layers. Adsorption of water vapour produces an overlayer less than one layer in depth at an exposure of 105 L. Comparison of the overlayer depths calculated from the decrease in unoxidised iron signal intensity and from the increase in oxygen intensity gives good agreement for the thick oxide film produced by oxygen adsorption, but not for the thin overlayer formed by exposure to water vapour. This suggests a difference in packing of the ions in the thin overlayer compared to the arrangement in the bulk oxide.
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