Plasma resonance absorption in interfacial photoemission from very thin silver films on Cu(111) |
| |
Authors: | J.K Sass S Stucki H.J Lewerenz |
| |
Affiliation: | Fritz-Haber-Institut der Max-Planck-Gesellschaft, Faradayweg 4-6, D-1000 Berlin 33, Germany |
| |
Abstract: | Very thin silver films deposited on a Cu(111) substrate were studied with the photoemission-into-electrolyte technique. The optical resonance absorption at the silver bulk plasma frequency was observed for films thicker than two monolayers. The correlation between optical absorption and photoemission intensities depends in a complicated fashion on the photon energy as well as the film thickness. |
| |
Keywords: | |
本文献已被 ScienceDirect 等数据库收录! |