Anode spot plasma deposition of insulating layers on aluminum |
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| Authors: | Ghaemi M.S. Cooney J. Tao J. Lim W.-B. Lonngren K.E. |
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| Affiliation: | Iowa Univ., Iowa City, IA; |
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| Abstract: | The deposition of an insulating layer upon an aluminum plate in an argon plasma is described. The process is effected in a low-power DC discharge to which a small amount of sulfur hexafluoride (SF6) has been added, causing the formation of anode spots at sharp metallic surfaces. The insulator is deposited in the region beneath the spot |
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