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Microwave complementary doped-channel field-effect transistors
Authors:Jung-Hui Tsai  Shao-Yen Chiu  Wen-Shiung Lour  Wen-Chau Liu  Chien-Ming Li  Ning-Xing Su  Yi-Zhen Wu  Yin-Shan Huang
Institution:1. Department of Electronic Engineering, National Kaohsiung Normal University, 116, Ho-ping 1st Road, Kaohsiung, Taiwan;2. Department of Electrical Engineering, National Taiwan Ocean University, 2 Peining Road, Keelung, Taiwan;3. Institute of Microelectronics, Department of Electrical Engineering, National Cheng-Kung University, 1 University Road, Tainan, Taiwan;4. Department of Physics, National Kaohsiung Normal University, 116, Ho-ping 1st Road, Kaohsiung, Taiwan
Abstract:In this paper, the device performance and complementary inverter of the InGaP/InGaAs/GaAs doped-channel field-effect transistors (DCFETs) by two-dimensional semiconductor simulation are demonstrated. Due to the relatively large conduction (valance) band discontinuity at InGaP/InGaAs interface, it provides good confinement effect for transporting carriers in InGaAs channel layer for the n-channel (p-channel) device. The large gate turn-on voltage is achieved due to the employment of the wide energy-gap InGaP material as gate layer. The ftft and fmaxfmax are of 6.5 (2.1) and 25 (5) GHz for the n-channel (p-channel) device. Furthermore, the co-integrated structures, by the combination of n- and p-channel field-effect transistors, could form a complementary inverter and the relatively large noise margins are achieved.
Keywords:Complementary  Inverter  InGaP/InGaAs/GaAs  Doped-channel  Field-effect transistors  Confinement effect  Noise margin
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