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Electrochemical characteristics of alumina dielectric layers |
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| Authors: | Han-Jun Oh Yongsoo Jeong Young-Jik Kim |
| Affiliation: | a Department of Materials Science, Hanseo University, Seosan 352-820, South Korea b Korea Institute of Machinery and Materials, Changwon 641-010, South Korea c Department of Metallurgical Engineering, Sung Kyun Kwan University, Suwon 440-746, South Korea d School of Metallurgical and Materials Engineering, Kookmin University, Seoul 136-702, South Korea |
| Abstract: | The electrochemical characteristics of alumina dielectric layers were studied using a surface roughness factor and an impedance spectroscopy. From the limiting diffusion current method, the surface area factor of the dielectric anodic layer with low electrical conductivity was estimated to be 1.03. As alumina dielectric films on Al have a variable stoichiometry, the electrochemical behavior of Al2O3 layer can be monitored by evaluating an equivalent circuit with Young impedance of dielectric constant with a vertical decay of conductivity. |
| Keywords: | Aluminum oxide Electrolytic capacitor Electrochemical impedance spectroscopy Rutherford backscattering spectrometry Transmission electron microscopy |
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