首页 | 本学科首页   官方微博 | 高级检索  
     


H processing of copper surfaces
Authors:M. Mozetič  M. Kveder  T. Mozetič  M. Drobnič
Affiliation:1. Institute of Electronics and Vacuum Technology, Teslova 30, 61000, Ljubljana, Slovenia
2. Secondary Health School, Ipav?eva 10, 6300, Celje, Slovenia
3. Institut Jozef Stefan, Jamova 39, 6100, Ljubljana, Slovenia
Abstract:Changes in the crystallographic structure of polycrystalline copper surface due to the atomic hydrogen treatment are described. Samples of polycrystalline OFHC copper plates were exposed to a flux of thermal hydrogen atoms with the density between 1×1021 atoms/m2s and 1×1023 atoms/m2s. Hydrogen atoms partially accommodate and recombine in the potential well on the surface. During these processes copper atoms on the surface displace, which leads to a recrystallization of the samples. The effects were investigated by a scanning electron microscope (SEM).
Keywords:
本文献已被 SpringerLink 等数据库收录!
设为首页 | 免责声明 | 关于勤云 | 加入收藏

Copyright©北京勤云科技发展有限公司  京ICP备09084417号