The third order nonlinear optical characteristics of amorphous vanadium oxide thin film |
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Authors: | U. Kürüm R. M. Öksüzoğlu M. Yüksek H. G. Yaglioglu H. Çınar Ayhan Elmali |
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Affiliation: | 1.Department of Engineering Physics, Faculty of Engineering,Ankara University,Ankara,Turkey;2.Department of Materials Sciences and Engineering, Faculty of Architecture and Engineering,Anadolu University,Eski?ehir,Turkey;3.Department of Physics, Science and Art Faculty,Kafkas University,Kars,Turkey |
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Abstract: | We studied the nonlinear absorptive characteristics (saturation intensity threshold and effective nonlinear absorption coefficients) and nonlinear refraction in a 50-nm-thick VO x thin amorphous film prepared by pulsed DC magnetron reactive sputtering. The absorptive and refractive nonlinearities were investigated by pump–probe and Z-scan techniques. The closed-aperture Z-scan results reveal self-defocussing characteristics of the amorphous VO x thin film for both nanosecond and picosecond pulse durations. Experimental results show that a phase transition does not occur in the range of intensities used for the experiments and the investigated sample can be treated as an amorphous semiconductor structure. The open-aperture Z-scan curves with nanosecond pulses exhibit saturable absorption for all input intensities. On the other hand, the open-aperture Z-scan curves with picosecond pulses exhibit nonlinear absorption/saturable absorption for low/high input intensities, respectively. Saturation intensity thresholds were found to be 15.3 MW/cm2 for 4-ns pulse duration and 586 MW/cm2 for 65-ps pulse duration. |
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