Electrical properties of GaAs layers irradiated by H4 ions

The quantities(D) and(T) are studied in n- and p-GaAs, irradiated at T = 300°K by H⁺ ions (5 MeV). It is shown that the resistance of lightly doped GaAs specimens increases from original values of₀ to 10⁹ ·cm upon irradiation by H⁺ ions (5 MeV) to integral fluxes up to D^* – 10¹⁵ H⁺/cm². For D > D^* the layer resistance decreases from 10⁹ ·cm to 1 ·cm at 300°K. It was found that all the GaAs specimens intensely irradiated by H⁺ ions had p-type conductivity near 300°K. Isochronic annealing of radiation defects was studied in the temperature interval 20–700°C.Translated from Izvestiya Vysshikh Uchebnykh Zavedenii, Fizika, No. 1, pp. 39–43, January, 1982.