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Local structure of porous silicon studied by means of X-ray emission spectroscopy
Authors:E.Z. Kurmaev  V.R. Galakhov  S.N. Shamin  V.I. Sokolov  R.E. Hummel  M.H. Ludwig
Affiliation:(1) Institute of Metal Physics, Russian Academy of Sciences – Ural Division, S. Kovalevskaya str. 18, 620219 Yekaterinburg GSP-170, Russia (E-mail: kurmaev@ifmlrs.intec.ru), RU;(2) Department of Materials Science and Engineering, University of Florida, Gainesville, FL 32611, USA (E-mail: mludwig@nervm.nerdc.ufl.edu), US
Abstract:2,3 X-ray emission spectra of porous silicon (P-Si) and of spark-processed silicon (sp-Si). Both types of Si-structure display strong photoluminescence in the visible range of the spectrum. Porous samples were prepared by anodization of n-- and p+-Si-wafers. Whereas for the P-Si processed from p+-Si the presence of some amorphous silicon is detected, the X-ray emission spectra of porous Si prepared from n--Si display a higher content of SiO2. For spark-processed Si the Si L2,3 X-ray emission spectra reveal a much stronger degree of oxidation which extends to depths larger than 10000 Å. Furthermore, the chemical state of silicon atoms of sp-Si measured at the center of the processed area is close to that of silicon dioxide, and it has an influence on the photoluminescence energy. Specifically, green photoluminescent sp-Si shows a higher degree of oxidation than the blue luminescent specimen. However, the depth of oxidation consistently decreases in areas with weak or no PL. Possible origins of the observed photoluminescence are discussed. Accepted: 6 March 1997
Keywords:PACS: 73.20 Dx   71.20 Mq   71.20-b
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