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硅单晶提拉生长中拉速稳定性研究
引用本文:付永领,张凯,祁晓野. 硅单晶提拉生长中拉速稳定性研究[J]. 人工晶体学报, 2009, 38(6): 1493-1498
作者姓名:付永领  张凯  祁晓野
作者单位:北京航空航天大学自动化科学与电气工程学院,北京,100083
摘    要:为解决硅单晶提拉生长过程中拉速不稳定、波动较大的问题,在分析晶体生长界面热量及质量传输的基础上,通过控制温度补偿速率来抑制拉速大幅波动.采取基于遗传算法优化隶属度函数的模糊控制策略,对温度补偿速率进行控制,调节加热功率,使炉内热环境处于适宜晶体生长的范围.实验结果表明,在提高系统控径精度的同时,拉速稳定性也有显著提高,大幅波动明显减少.

关 键 词:温度补偿  拉速稳定性  模糊控制  遗传算法  提拉法,

Study on Stability of the Pull Rate in the Czochralski Growth Process of Single Silicon
FU Yong-ling,ZHANG Kai,QI Xiao-ye. Study on Stability of the Pull Rate in the Czochralski Growth Process of Single Silicon[J]. Journal of Synthetic Crystals, 2009, 38(6): 1493-1498
Authors:FU Yong-ling  ZHANG Kai  QI Xiao-ye
Abstract:For the purpose of reducing the pull rate fluctuation during the Czochralski crystal growth process of single silicon, the approach of controlling the temperature compensation rate was presented based on analyzing the energy and mass balance at the solid-liquid interface. A new fuzzy control method was proposed of which the membership function parameters were optimized using the genetic algorithm to tune the power input, thus the inner circumstance of the furnace was more suitable for the crystal growth. Experiment data verifies that with this approach, the precision of the crystal diameter was improved and the pull rate fluctuation was considerable reduced also.
Keywords:temperature compensation  pull rate stability  fuzzy control  genetic algorithm  Czochralski method
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