Optoelectronic resonant cavity technology based on inversion channel devices |
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Authors: | P. A. Evaldsson S. Daryanani P. Cooke G. W. Taylor |
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Affiliation: | (1) AT & T Bell Laboratories, Crawfords Corner Road, 07733 Holmdel, NJ, USA;(2) University of Bradford, Bradford, England |
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Abstract: | In this paper the implementation of the inversion channel technology in a vertical cavity configuration is demonstrated. It is shown that by using a universal processing sequence a bistable surface emitting laser, a resonant cavity detector and a hetero-structure field effect transistor (H FET) can all be realized from a single epitaxial growth. The surface emitting double heterostructure opto-electronic switch (DOES) laser exhibits a pulsed threshold current of 10 mA for a 14 m diameter device. The resonant cavity detector achieved a peak responsivity of 0.6 AW–1 in the H FET mode and 19 AW–1 when operated in phototransistor mode. The H FET had a peak transconductance of 40 mS mm–1 and a peak source to drain current density of 120 mA mm–1. |
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