| 一种基于光电极值法的光学膜厚监控系统的改进设计 |
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| 引用本文： | 权贵秦,韩军,弥谦.一种基于光电极值法的光学膜厚监控系统的改进设计[J].应用光学,2002,23(4):30-32,25. |
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| 作者姓名： | 权贵秦 韩军 弥谦 |
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| 作者单位： | 西安工业学院,陕西省薄膜技术与光学检测重点实验室,陕西,710032 |
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| 摘 要： | 介绍目前通用的基于光电极值法的光学膜厚监控系统的特点，针对其缺点进行改进设计，新系统的稳定性有较大提高，可满足镀制多层介质薄膜器件的要求。
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| 关 键 词： | 系统设计 光学薄膜 光学膜厚控制系统 光电极值法 |
| 文章编号： | 1002-2082(2002)04-0030-03 |
| 收稿时间： | 2002/3/8 |
A KIND OF IMPROVE DESIGN FOR SYSTEM OF OPTICAL THIN-FILM THICKNESS MONITORING CONTROL BASED ON THE METHOD OF PHOTOELECTRICITY LIMITING VALUE |
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| QUAN Gui qin,HAN Jun,MI Qian.A KIND OF IMPROVE DESIGN FOR SYSTEM OF OPTICAL THIN-FILM THICKNESS MONITORING CONTROL BASED ON THE METHOD OF PHOTOELECTRICITY LIMITING VALUE[J].Journal of Applied Optics,2002,23(4):30-32,25. |
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| Authors: | QUAN Gui qin HAN Jun MI Qian |
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| Abstract: | This paper introduceds the feature of optical film thickness monitoring control system based on the method of photoelectricity limiting value at present, and then improves the design aimed at the defect of the system. The stability of new system increases greatly and can satisfy the demond of producing the elements of multi medium thin film. |
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| Keywords: | film thickness monitoring control system design |
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