首页 | 本学科首页   官方微博 | 高级检索  
     检索      


Mass flow in laser-plasma deposition of carbon under oblique angles of incidence
Authors:F Davanloo  E M Juengerman  D R Jander  T J Lee  C B Collins  E Matthias
Institution:(1) Center for Quantum Electronics, University of Texas at Dallas, 75083-0688 Richardson, TX, USA;(2) Fachbereich Physik, Freie Universität Berlin, W-1000 Berlin 33, Fed. Rep. Germany
Abstract:The angular distribution of the mass flow in carbon laser plasmas, generated from graphite targets at laser power densities around 1011 W/cm2 and 1064 nm, was studied. Under oblique angles of incidence the mass flow is not perpendicular to the target surface but rather symmetrical around the bisecting angle between the laser beam and the surface normal. For all angles, however, a cos4thetav-pattern is observed. Compared to normal incidence the mass flow is weaker by about a factor of 2 to 3 for 30° and 50° angle of incidence. The dependence of film quality on deposition angle with regard to the symmetry axis of the plume is demonstrated.Presented at LASERION '91, June 12–14, 1991, München (Germany)
Keywords:52    J  81  15
本文献已被 SpringerLink 等数据库收录!
设为首页 | 免责声明 | 关于勤云 | 加入收藏

Copyright©北京勤云科技发展有限公司  京ICP备09084417号