Strain interactions and defect formation in stacked InGaAs quantum dot and dot-in-well structures

The growth of high-quality stacked quantum dot (QD) structures represents one of the key challenges for future device applications. Electronic coupling between QDs requires closely separated electronic levels and thin barrier layers, requiring near identical composition and shape, despite strong strain interactions. This paper presents a detailed characterization study of stacked InGaAs QD and InAs/InGaAs dot-in-well (DWELL) structures using cross-sectional transmission electron microscopy. For In_.5Ga_.5As/GaAs QD structures we have observed optimized stacking using a barrier thickness 12 nm.We also report studies of stacking in DWELL laser structures. Despite reports of very low threshold currents in such lasers, designed for 1.3 μm emission, performance is limited by gain saturation and thermal excitation effects. We have explored solutions to these problems by stacking multiple DWELL layers of three, five and 10 repeats. Initial attempts at stacked multilayer structures, particularly samples with a large number of repeats, produced variable results, with a number of the final devices characterized by poor emission and electrical characteristics. Analysis by transmission electron microscopy has identified the presence of large defective regions arising from the complex interaction of dots on several planes and propagating threading dislocations into the cladding layers. The origin of this defect is identified as the coalescence of QDs at very high density and the resulting dislocation propagating to higher dot planes. An effective modified method to reduce the defect density by growing the barrier layer at higher temperature will be discussed. Finally, we report the growth of a stacked 10-layer structure using relatively thin barriers, grown using this technique.