Influence of Second-Order Lines on the Quantitative Wavelength Dispersive Spectrometry Analysis at Low Accelerating Voltages |
| |
Authors: | Valdek Mikli |
| |
Institution: | (1) Centre for Materials Research, Tallinn University of Technology, Ehitajate tee 5, 19086 Tallinn, Estonia |
| |
Abstract: | The study covers a problem frequently encountered in the quantification of the results of wavelength-dispersive spectrometry
(WDS) for the composition analysis of thin films. The characteristics of a Parallel Beam Spectrometer and traditional WDS
systems were examined and olivine mineral – (Mg, Fe)2SiO4 (O – 44.03 wt%, Mg – 31.1 wt%, Si – 19.56 wt%, Fe – 5.06 wt%, Ni – 0.16 wt%, Mn – 0.09 wt%) was used as a reference material.
Low accelerating voltage at 7 kV and beam current 400 nA were applied. Both methods yielded 30–35% of Mn. This is attributed
to the overlapping of the MnLα first-order and the MgKα second-order lines. Studies of the influences of the second- and the
third-order lines show that the second-order lines from Kα and Lα X-ray counts affected significantly the obtained WDS spectra
when the influence of Mα counts was insignificant. Furthermore, the third-order lines did not have a marked effect on the
analysis results. |
| |
Keywords: | : WDS low accelerating voltage second-order line |
本文献已被 SpringerLink 等数据库收录! |
|