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Optical Properties of the SiOx (x < 2) Thin Films Obtained by Hydrogen Plasma Processing of Thermal Silicon Dioxide |
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| Authors: | Kruchinin V. N. Perevalov T. V. Aliev V. Sh. Iskhakzai R. M. Kh. Spesivtsev E. V. Gritsenko V. A. Pustovarov V. A. |
| Affiliation: | 1.Rzhanov Institute of Semiconductor Physics, Siberian Branch, Russian Academy of Sciences, 630090, Novosibirsk, Russia ;2.Novosibirsk State University, 630090, Novosibirsk, Russia ;3.Ural Federal University, 620002, Yekaterinburg, Russia ;4.Novosibirsk State Technical University, 630073, Novosibirsk, Russia ; |
| Abstract: | Optics and Spectroscopy - The optical properties and composition of thermal silicon oxide thin films processed in a hydrogen electron cyclotron resonance plasma have been studied by ellipsometry,... |
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