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Miniature plasma focus as a novel device for synthesis of soft magnetic FeCo thin films
Authors:ZY Pan  R Verma  JJ Lin  RV Ramanujan  SV Springham
Institution:a NSSE, National Institute of Education, Nanyang Technological University, 1 Nanyang walk, Singapore 637616
b School of Materials Science and Engineering, Nanyang Technological University, Nanyang Avenue, Singapore 639798
c Pulsed Power Group, Institute for Plasma Research, Bhat, Gandhinagar, Gujarat, India 382428
d Solar Energy Research Institute of Singapore, National University of Singapore, 7 Engineering Drive 1, Singapore 117574
Abstract:The Letter reports the first ever application of low energy miniature plasma focus device as a deposition facility for nanostructured thin films. We demonstrate successful utilization of a 120 J fast miniature plasma focus device as a novel facility for the deposition of magnetically soft FeCo thin films. Different gas types and the substrate materials were used to investigate their effects on magnetic properties of the films. The FeCo films deposited on Si(100) with hydrogen as the filling gas were found to have an average grain size of 10.8±1.2 nm with narrow size distribution and soft magnetic properties with coercivity of about 6.3 Oe. The experimental coercivity value matched reasonably well with the theoretical calculation done using ripple theory.
Keywords:Miniature plasma focus device  Soft magnetic thin films  FeCo
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