RF exciplex halogen source of UV radiation on an argon-xenon-chlorine mixture |
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Authors: | A K Shuaibov I V Shevera I A Grabovaya |
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Institution: | 1.Uzhgorod National University,Uzhgorod,Ukraine |
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Abstract: | An exciplex halogen source of UV radiation that is excited by an rf transverse discharge is studied experimentally. The active
medium of the source is an Ar-Xe-Cl2 mixture kept at a low pressure (100–1000 Pa), and its working spectral range is 220–450 nm. The radiation spectrum contains
235 nm XeCl(D-X), 257 nm Cl2(D′-A′), 306 nm XeCl(B-X), 390 nm XeCl(C-A), and 430 nm XeCl(B-A) lines. The results of optimization of the UV power as a function of the pressure, Ar-Xe-Cl2 mixture composition, and excitation power are reported. |
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