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Passivation and activation: How do monovalent atoms modify the reactivity of silicon surfaces?: A perspective on the article, “The mechanism of amine formation on Si(1 0 0) activated with chlorine atoms”, by C.C. Finstad, A.D. Thorsness, and A.J. Muscat |
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| Authors: | Robert J. Hamers |
| Affiliation: | Department of Chemistry, University of Wisconsin-Madison, 1101 University Avenue, Madison, WI 53706, United States |
| Abstract: | |
| Keywords: | Silicon surfaces Amine formation Chlorine atoms |
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