Adsorption of CO and C2H4 on Rh-loaded thin-film dysprosium oxide

A dysprosium oxide thin film was deposited on Ru(0 0 0 1) by vapor depositing Dy in 2 × 10⁻⁷ torr O₂ while the Ru was at 700 K. The film was ca. 5 nm thick and produced a p(1.4 × 1.4) LEED pattern relative to the Ru(0 0 0 1) substrate. The adsorption and reaction of CO and C₂H₄ adsorbed on Rh supported on the Dy₂O₃ film were studied by TPD and SXPS. The CO initially reacted with loosely bound oxygen in the substrate to produce CO₂. After the loosely bound oxygen was removed, the CO adsorbed non-dissociatively in a manner similar to what is seen on Rh(1 1 1). C₂H₄ adsorbed on the Rh particles and underwent progressive dehydrogenation to produce H₂ during TPD. The C from the C₂H₄ reacted with the O in Dy₂O₃ to produce CO. CO dissociation on the Rh particles could be promoted by treating the Dy₂O₃ with C₂H₄ before CO exposure.