Fabrication and chemical surface modification of nanoporous silicon for biosensing applications

In this work, porous silicon (PS) films with varied porosity (68–82%) were formed on the p-type, boron-doped silicon wafer (100) by the electrochemical anodisation in an aqueous hydrofluoric acid and isopropyl alcohol solution at different current densities (I _d) ranging from 20–70 mA cm^?2, respectively. Biofunctionalisation of the PS surface was carried out by chemically modifying the surface of PS by the deposition of 3-aminopropyltriethoxysilane thermally leading to high density of amine groups covering the PS surface. This further promotes the immobilisation of immunoglobulin (human IgG and goat anti-human IgG binding) on to the PS surface. Formation of nanostructured PS and the attachment of antibody–antigen to its surface were characterised using photoluminescence (PL), Fourier transform infrared spectroscopy and X-ray photoelectron spectroscopy techniques, respectively. The possibility of using these structures as biosensors has been explored based on the significant changes in the PL spectra before and after exposing the PS optical structures to biomolecules. These experimental results open the possibility of developing optical biosensors based on the variation of the PL position of the PL spectra of PS-based devices.