Surface modifications of ultra-thin gold films by swift heavy ion irradiation |
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Authors: | P Dash P Mallick H Rath B N Dash A Tripathi Jai Prakash D K Avasthi P V Satyam and N C Mishra |
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Institution: | (1) Institute of Earth Sciences, University of Heidelberg, 69210 Heidelberg, Germany;(2) Present address: Alfred Wegener Institute for Polar and Marine Research, 27568 Bremerhaven, Germany;(3) GSI Helmholtz Centre for Heavy Ion Research, 64291 Darmstadt, Germany;(4) Technische Universit?t Darmstadt, Hochschulstrasse 1, 64289 Darmstadt, Germany |
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Abstract: | Gold films of thickness 10 and 20 nm grown on float glass substrate by thermal evaporation technique were irradiated with
107 MeV Ag8+ and 58 MeV Ni5+ ions at different fluences and characterized by Grazing Incidence X-ray Diffraction (GIXRD) and Atomic Force Microscopy (AFM).
The pristine films were continuous and no island structures were found even at these small thicknesses. The surface roughness
estimated from AFM data did not show either monotonic increase or decrease with ion fluences. Instead, it increased at low
fluences and decreased at high fluences for 20 nm thick film. In the 10 nm film roughness first increased with ion fluence,
then decreased and again increased at higher fluences. The pattern of variation, however, was identical for Ni and Ag beams.
Both the beams led to the formation of cracks on the film surface at intermediate fluences. The observed ion-irradiation induced
thickness dependent topographic modification is explained by the spatial confinement of the energy deposited by ions in the
reduced dimension of the films. |
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