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Acid‐Stable Peroxoniobophosphate Clusters To Make Patterned Films
Authors:Dr. Jung‐Ho Son  Deok‐Hie Park  Prof. Douglas A. Keszler  Prof. William H. Casey
Affiliation:1. Department of Chemistry, University of California, Davis, One Shields Ave, Davis, CA 95616 (USA), Fax: (+1)?530‐752‐8995;2. Department of Chemistry, 153 Gilbert Hall, Oregon State University, Corvallis, OR 97331‐4003 (USA);3. Department of Earth and Planetary Science, One Shields Ave, Davis, CA 95616 (USA)
Abstract:Two new peroxoniobophosphate clusters were isolated as tetramethylammonium (TMA) salts having the stoichiometries: TMA5[HNb4P2O14(O2)4]?9 H2O and TMA3[H7Nb6P4O24(O2)6]?7 H2O. The former is stable over the pH range: 37Nb6P4O24(O2)6]3? cluster can be used to fabricate patterned niobium phosphate films by electron‐beam lithography after solution deposition.
Keywords:niobium  peroxides  phosphorus  polyoxometalates  synthesis
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