Transverse electron focusing as a way of studying surface crystallography |
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| Authors: | VS Tsoi J Bass P Wyder |
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| Institution: | 1. Max Planck Institut für Festk?rperforschung, Hochfeld-Magnetlabor , B.P. 166X, F-38042, Grenoble-Cedex, France;2. Institute of Solid State Physics , Moscow District, Chernogolovka, 142432, Russia;3. Department of Physics and Astronomy , Michigan State University , Physics-Astronomy Building, East Lansing, Michigan, 48824-1116, USA;4. Max Planck Institut für Festk?rperforschung, Hochfeld-Magnetlabor , B.P. 166X, F-38042, Grenoble-Cedex, France |
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| Abstract: | Conduction electrons represent a unique probe for studying surfaces (and interfaces) due to their extremely low excitation energies and to the fact that they impinge upon the surface from inside the sample. Focusing of conduction electrons by means of a transverse homogeneous magnetic field—transverse electron focusing (TEF)—provides a means for probing the atomic structure and composition of surfaces and interfaces, including both regular and irregular roughness. This article explains what TEF is, reviews what has been learned from it about surface structure, and describes what can be learned in the future. |
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