空心圆管端点附近等离子体源离子注入过程中鞘层的时空演化

等离子体源离子注入过程中，鞘层的演化规律直接影响到离子注入到材料中的深度进而影响材料表面的性质和结构，对材料的不同部位这种影响是不同的.利用无碰撞两维流体动力学模型，研究了有限上升时间的电压脉冲作用下，共轴放置附加零电极的半无限空心圆管端点附近等离子体源离子注入过程中，鞘层的时空演化规律.通过计算得到了鞘层内随时间变化的电势分布和离子密度分布，计算了端点附近材料表面处的离子流密度分布和注入剂量分布随时间的变化规律.计算机模拟结果显示了空心圆管内部、外部及端点表面处的离子流密度分布和注入剂量分布存在很大差异.

Plasma source ion implantation near the end of a cylindrical bore using an auxiliary electrode for finite rise time voltage pulses

The temporal evolution of the plasma sheath during plasma source ion implantation(PSII) is crucial because it affects the resultant surface properties and structures. In this paper two dimensional fluid model is applied to the problem in computing ion dynamics in the sheath of the end of a cylindrical bore using an auxiliary electrode for finite rise time voltage pulses. The ion density, flux, dose distributions are calculated by solving Poisson's equation and the equations of ion motion and continuity using finite difference methods. Our results indicate that there exist the differences of ion flux and dose among the inner, outer surfaces and the end surface of the bore.