| 灰阶编码掩模制作微光学元件 |
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| 引用本文： | 粟敬钦,姚军,杜惊雷,张怡霄,高福华,郭永康,崔铮.灰阶编码掩模制作微光学元件[J].光学学报,2001,21(1):7-100. |
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| 作者姓名： | 粟敬钦 姚军 杜惊雷 张怡霄 高福华 郭永康 崔铮 |
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| 作者单位： | 1. 四川大学物理系， 成都 610064
2. 英国卢瑟福国家实验室 |
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| 基金项目： | 中国科学院光电技术研究所微细加工光学技术国家重点实验室资助项目 |
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| 摘 要： | 提出一种基于改变灰阶编码掩模的单元形状和位置的掩模设计新方法，并根据成像过程中的非线性因素，用这种方法对掩模图形进行了预畸变校正，根据部分相干光成像理论和抗蚀剂曝光显影模型，模拟计算了这种灰阶编码掩模产生的空间光强分布和光刻胶上的浮雕结构，采用电子束曝光系统制作了这种掩模，并在光刻胶上获得具有连续面形的微透镜的阵列。
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| 关 键 词： | 编码灰阶掩模 光刻 微光学元件 光电器件 |
Coding Gray-Tone Mask for Fabrication of Microoptical Elements |
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| Su Jingqin,Yao Jun,Du Jinglei,Zhang Yixiao,Gao Fuhua,Guo Yongkang.Coding Gray-Tone Mask for Fabrication of Microoptical Elements[J].Acta Optica Sinica,2001,21(1):7-100. |
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| Authors: | Su Jingqin Yao Jun Du Jinglei Zhang Yixiao Gao Fuhua Guo Yongkang |
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| Abstract: | A new method is proposed to design coding gray tone masks based on modifying position and shape of cell on mask. Pre distortion applied to modify mask has been implemented by introducing this method according to the nonlinear effects in aerial image and resist development. Based on the theory of partial coherent light imaging and the resist development model, the intensity distribution through the coding gray tone mask and exposure of photoresist have been simulated. The coding gray tone mask was fabricated by e beam exposure system and microlens array with continuous relief distribution on photo resist was obtained. |
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| Keywords: | coding gray tone mask optical lithography micro optical elements |
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