Growth and characterization of GaN nanorods through ammoniating process by magnetron sputtering on Si(111) substrates

GaN nanorods have been successfully synthesized on Si(111) substrates by magnetron sputtering through ammoniating Ga₂O₃/ZnO films at 950 °C in a quartz tube. The GaN nanorods are characterized by X-ray diffraction, scanning electron microscopy, field-emission transmission electron microscopy, X-ray photoelectron spectroscopy and fluorescence spectrophotometry. The results show that the nanorods have a pure hexagonal GaN wurtzite structure with lengths of about several micrometers and diameters of about 200 nm, and the growth direction of the GaN nanorods is parallel to the (101) plane. The photoluminescence spectrum indicates that the nanorods have a good emission property. Finally, the growth mechanism is also briefly discussed. PACS 61.46.+w; 78.55.Cr; 81.15.Cd; 81.07.-b; 82.30.Hk